- •1874 - Semiconductor Point-Contact Rectifier Effect
- •1930: Field Effect Semiconductor Device Concepts
- •1940 - Discovery of the p-n Junction
- •1947 - Invention of the Point-Contact Transistor in
- •1958 - All semiconductor “Hybris Integrated Circuit" is demonstrated in Germanium
- •1959 - Practical Monolithic Integrated Circuit
- •1960 - MOS Transistor Demonstrated
- •1963 - Complementary MOS Circuit Invented
- •1965 - "Moore's Law" Predicts the Future of
- •1974 - Scaling of IC Process Design Rules
- •Thank you
1874 - Semiconductor Point-Contact Rectifier Effect
Discovered
Ferdinand Braun
Nobel Laureate in Physics in 1909
In the first written description of a semiconductor diode, he noted that current flows freely in only one direction at the contact between a metal point and a galena crystal (lead sulfide). More famous for his invention of CRT.
arasw Source for this and next 8 slides: http://www.computerhistory.org/semiconductor/timeline.html
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IEEE DRC, 22 June, 2014 |
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1930: Field Effect Semiconductor Device Concepts
Patented
Julius Lilienfeld
Julius Lilienfeld filed a patent describing a three-electrode amplifying device based on the semiconducting properties of copper sulfide. He did not demonstrate the device experimentally.
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IEEE DRC, 22 June, 2014 |
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1940 - Discovery of the p-n Junction
Russell Ohl and Jack Scaff
Russell Ohl and Jack Scaff at Bell Telephone Labs discovered the p-n junction and photovoltaic effects in silicon that lead to the development of junction transistors and solar cells.
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IEEE DRC, 22 June, 2014 |
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1947 - Invention of the Point-Contact Transistor in
Germanium
By Bardeen, Brattain, and Shockley,
Nobel Laureates in Physics 1956
1947
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IEEE DRC, 22 June, 2014 |
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tanford University |
1958 - All semiconductor “Hybris Integrated Circuit" is demonstrated in Germanium
By Jack Kilby (TI),
Nobel Laureates in Physics 2000
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IEEE DRC, 22 June, 2014 |
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1959 - Practical Monolithic Integrated Circuit
Concept Patented
Robert Noyce
Challenged by patent attorney to identify other uses for Hoerni’s
planar process, Fairchild co-founder Robert Noyce conceived the idea for a monolithic integrated circuit (IC) in silicon.
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IEEE DRC, 22 June, 2014 |
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1960 - MOS Transistor Demonstrated
Dawon Kahng
John Atalla
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John Atalla and Dawon Kahng at Bell demonstrate the |
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first successful silicon PMOS field-effect amplifier. |
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IEEE DRC, 22 June, 2014 |
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1963 - Complementary MOS Circuit Invented
Frank Wanlass and C. T. Sah at Fairchild R & D Labs report the lowest power logic configuration .
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IEEE DRC, 22 June, 2014 |
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1965 - "Moore's Law" Predicts the Future of
Integrated Circuits
Gordon Moore
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Electronics Magazine (April 1965) |
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IEEE, IEDM (1975) |
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Cost vs. time sketch from Moore's 1964 notebook |
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IEEE DRC, 22 June, 2014 |
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1974 - Scaling of IC Process Design Rules
Quantified
Robert Dennard, et al., IEEE J. Solid State Circuits, Oct. 1974.
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tanfordat University
Constant E Field Scaling
All device parameters are scaled by the same factor .
•Channel length L
•Gate oxide thickness tox
•Supply voltage VD
•Source/drain junction depth Xj
•Channel doping
IEEE DRC, 22 June, 2014 |
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