- •Одеський національний політехнічний університет
- •Міністерство освіти і науки України одеський національний політехнічний університет
- •Протокол № 8 від 24.03.09
- •Наука і техніка
- •Lesson 1
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •In; one; licenses; through; systems.
- •Lesson 2
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 3
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 4
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 5
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 6
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 7
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 8
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 9
- •After text activity
- •I. Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
- •Lesson 10
- •After text activity
- •Reading Exercises:
- •II. Speaking Exercises:
- •III. Writing exercises:
After text activity
I. Reading Exercises:
Exercise 1. Read and memorize using a dictionary:
gating function, leading-edge, processes, power consumption, customers, critical dimensions, photoresist, to be exposed, consistent in scaling, embedded phase shifting, reticule, effect of exposure, anticipate, shrink, mature. |
Exercise 2. Answer the questions:
What is lithography?
What are the ways of using lithography tools?
How does TI expertise allow them to develop leading-edge processes?
How can you classify critical dimensions of transistors?
What is the next generation of lithography tools?
Exercise 3. Match the left part with the right:
1. Embedded phase shifting within the reticule enables us |
a) the cost of making reticules. |
2. These types of improvements drive up |
b) to take us beyond that point. |
3. This process keeps |
c) light wavelengths to 157 nm. |
4. These tools will shrink |
d) to focus light at sub-wavelength dimensions. |
5. Extreme ultraviolet is proposed
|
e) time and expense to a minimum. |
Exercise 4. Open brackets choosing the right words:
While all semiconductor (manufacturers/producers) are dependent on the same (accessible/available) lithography tools, the (roads/ways) of (using/utilizing) those tools vary depending on the expertise and (requirements/demands) of the manufacturer.
II. Speaking Exercises:
Exercise 1. Describe lithography; gate; scale; reticule; exposure using the suggested words and expressions as in example:
lithography a method; of; planographic printing; from; a metal; or; stone surface. example: A method of planographic printing from a metal or stone surface. |
gate a computer circuit; with; several inputs; but; only; one output; that; can be activated; by; particular combinations; of; inputs. |
scale an indicator; having; a graduated sequence; of; marks. |
reticule a network; of; fine lines; dots; cross hairs; or; wires; in; the focal plane; of; the eyepiece; of; an optical instrument. |
exposure the act; of; subjecting; someone; to; an influencing; experience. |
Exercise 2. Ask questions to the given answers:
1. Question: __________________________________?
Answer: Lithography is the gating function in the development of new CMOS manufacturing processes.
2. Question: __________________________________?
Answer: Our expertise allows us to develop leading-edge processes with the right balance of performance, cost and power consumption for our customers.
3. Question: __________________________________?
Answer: Electron beam projection printing is also likely to become important as the alternative technology matures.