- •Preface
- •Contents
- •1.1 Fundamentals of the semiclassical laser theory
- •1.1.1 The laser oscillator
- •1.1.2.2 Homogeneous, isotropic, linear dielectrics
- •1.1.2.2.1 The plane wave
- •1.1.2.2.2 The spherical wave
- •1.1.2.2.3 The slowly varying envelope (SVE) approximation
- •1.1.2.3 Propagation in doped media
- •1.1.3 Interaction with two-level systems
- •1.1.3.1 The two-level system
- •1.1.3.2 The dipole approximation
- •1.1.3.2.1 Inversion density and polarization
- •1.1.3.3.1 Decay time T1 of the upper level (energy relaxation)
- •1.1.3.3.1.1 Spontaneous emission
- •1.1.3.3.1.2 Interaction with the host material
- •1.1.3.3.1.3 Pumping process
- •1.1.3.3.2 Decay time T2 of the polarization (entropy relaxation)
- •1.1.4 Steady-state solutions
- •1.1.4.1 Inversion density and polarization
- •1.1.4.2 Small-signal solutions
- •1.1.4.3 Strong-signal solutions
- •1.1.5 Adiabatic equations
- •1.1.5.1 Rate equations
- •1.1.5.2 Thermodynamic considerations
- •1.1.5.3 Pumping schemes and complete rate equations
- •1.1.5.3.1 The three-level system
- •1.1.5.3.2 The four-level system
- •1.1.5.5 Rate equations for steady-state laser oscillators
- •1.1.6 Line shape and line broadening
- •1.1.6.1 Normalized shape functions
- •1.1.6.1.1 Lorentzian line shape
- •1.1.6.1.2 Gaussian line shape
- •1.1.6.1.3 Normalization of line shapes
- •1.1.6.2 Mechanisms of line broadening
- •1.1.6.2.1 Spontaneous emission
- •1.1.6.2.2 Doppler broadening
- •1.1.6.2.3 Collision or pressure broadening
- •1.1.6.2.4 Saturation broadening
- •1.1.6.3 Types of broadening
- •1.1.6.3.1 Homogeneous broadening
- •1.1.6.3.2 Inhomogeneous broadening
- •1.1.6.4 Time constants
- •1.1.7 Coherent interaction
- •1.1.7.1 The Feynman representation of interaction
- •1.1.7.3 Propagation of resonant coherent pulses
- •1.1.7.3.2 Superradiance
- •1.1.8 Notations
- •References for 1.1
- •2.1.1 Introduction
- •2.1.3 Radiometric standards
- •2.1.3.1 Primary standards
- •2.1.3.2 Secondary standards
- •References for 2.1
- •2.2 Beam characterization
- •2.2.1 Introduction
- •2.2.2 The Wigner distribution
- •2.2.3 The second-order moments of the Wigner distribution
- •2.2.4 The second-order moments and related physical properties
- •2.2.4.3 Phase paraboloid and twist
- •2.2.4.4 Invariants
- •2.2.4.5 Propagation of beam widths and beam propagation ratios
- •2.2.5.1 Stigmatic beams
- •2.2.5.2 Simple astigmatic beams
- •2.2.5.3 General astigmatic beams
- •2.2.5.4 Pseudo-symmetric beams
- •2.2.5.5 Intrinsic astigmatism and beam conversion
- •2.2.6 Measurement procedures
- •2.2.7 Beam positional stability
- •References for 2.2
- •3 Linear optics
- •3.1 Linear optics
- •3.1.1 Wave equations
- •3.1.2 Polarization
- •3.1.3 Solutions of the wave equation in free space
- •3.1.3.1 Wave equation
- •3.1.3.1.1 Monochromatic plane wave
- •3.1.3.1.2 Cylindrical vector wave
- •3.1.3.1.3 Spherical vector wave
- •3.1.3.2 Helmholtz equation
- •3.1.3.2.1 Plane wave
- •3.1.3.2.2 Cylindrical wave
- •3.1.3.2.3 Spherical wave
- •3.1.3.2.4.2 Real Bessel beams
- •3.1.3.2.4.3 Vectorial Bessel beams
- •3.1.3.3 Solutions of the slowly varying envelope equation
- •3.1.3.3.1 Gauss-Hermite beams (rectangular symmetry)
- •3.1.3.3.2 Gauss-Laguerre beams (circular symmetry)
- •3.1.3.3.3 Cross-sectional shapes of the Gaussian modes
- •3.1.4.4.2 Circular aperture with radius a
- •3.1.4.4.2.1 Applications
- •3.1.4.4.3 Gratings
- •3.1.5 Optical materials
- •3.1.5.1 Dielectric media
- •3.1.5.2 Optical glasses
- •3.1.5.3 Dispersion characteristics for short-pulse propagation
- •3.1.5.4 Optics of metals and semiconductors
- •3.1.5.6 Special cases of refraction
- •3.1.5.6.2 Variation of the angle of incidence
- •3.1.5.7 Crystal optics
- •3.1.5.7.2 Birefringence (example: uniaxial crystals)
- •3.1.5.8 Photonic crystals
- •3.1.5.9 Negative-refractive-index materials
- •3.1.5.10 References to data of linear optics
- •3.1.6 Geometrical optics
- •3.1.6.1 Gaussian imaging (paraxial range)
- •3.1.6.1.1 Single spherical interface
- •3.1.6.1.2 Imaging with a thick lens
- •3.1.6.2.1 Simple interfaces and optical elements with rotational symmetry
- •3.1.6.2.2 Non-symmetrical optical systems
- •3.1.6.2.3 Properties of a system
- •3.1.6.2.4 General parabolic systems without rotational symmetry
- •3.1.6.2.5 General astigmatic system
- •3.1.6.2.6 Symplectic optical system
- •3.1.6.2.7 Misalignments
- •3.1.6.3 Lens aberrations
- •3.1.7 Beam propagation in optical systems
- •3.1.7.2.1 Stigmatic and simple astigmatic beams
- •3.1.7.2.1.1 Fundamental Mode
- •3.1.7.2.1.2 Higher-order Hermite-Gaussian beams in simple astigmatic beams
- •3.1.7.2.2 General astigmatic beam
- •3.1.7.3 Waist transformation
- •3.1.7.3.1 General system (fundamental mode)
- •3.1.7.3.2 Thin lens (fundamental mode)
- •3.1.7.4 Collins integral
- •3.1.7.4.1 Two-dimensional propagation
- •3.1.7.4.2 Three-dimensional propagation
- •3.1.7.5 Gaussian beams in optical systems with stops, aberrations, and waveguide coupling
- •3.1.7.5.1 Field distributions in the waist region of Gaussian beams including stops and wave aberrations by optical system
- •3.1.7.5.2 Mode matching for beam coupling into waveguides
- •3.1.7.5.3 Free-space coupling of Gaussian modes
- •References for 3.1
- •4.1 Frequency conversion in crystals
- •4.1.1 Introduction
- •4.1.1.1 Symbols and abbreviations
- •4.1.1.1.1 Symbols
- •4.1.1.1.2 Abbreviations
- •4.1.1.1.3 Crystals
- •4.1.1.2 Historical layout
- •4.1.2 Fundamentals
- •4.1.2.1 Three-wave interactions
- •4.1.2.2 Uniaxial crystals
- •4.1.2.3 Biaxial crystals
- •4.1.2.5.1 General approach
- •4.1.3 Selection of data
- •4.1.5 Sum frequency generation
- •4.1.7 Optical parametric oscillation
- •4.1.8 Picosecond continuum generation
- •References for 4.1
- •4.2 Frequency conversion in gases and liquids
- •4.2.1 Fundamentals of nonlinear optics in gases and liquids
- •4.2.1.1 Linear and nonlinear susceptibilities
- •4.2.1.2 Third-order nonlinear susceptibilities
- •4.2.1.3 Fundamental equations of nonlinear optics
- •4.2.1.4 Small-signal limit
- •4.2.1.5 Phase-matching condition
- •4.2.2 Frequency conversion in gases
- •4.2.2.1 Metal-vapor inert gas mixtures
- •4.2.2.3 Mixtures of gaseous media
- •References for 4.2
- •4.3 Stimulated scattering
- •4.3.1 Introduction
- •4.3.1.1 Spontaneous scattering processes
- •4.3.1.2 Relationship between stimulated Stokes scattering and spontaneous scattering
- •4.3.2 General properties of stimulated scattering
- •4.3.2.1 Exponential gain by stimulated Stokes scattering
- •4.3.2.2 Experimental observation
- •4.3.2.2.1 Generator setup
- •4.3.2.2.2 Oscillator setup
- •4.3.2.3 Four-wave interactions
- •4.3.2.3.1 Third-order nonlinear susceptibility
- •4.3.2.3.3 Higher-order Stokes and anti-Stokes emission
- •4.3.2.4 Transient stimulated scattering
- •4.3.3 Individual scattering processes
- •4.3.3.1 Stimulated Raman scattering (SRS)
- •4.3.3.2 Stimulated Brillouin scattering (SBS) and stimulated thermal Brillouin scattering (STBS)
- •4.3.3.3 Stimulated Rayleigh scattering processes, SRLS, STRS, and SRWS
- •References for 4.3
- •4.4 Phase conjugation
- •4.4.1 Introduction
- •4.4.2 Basic mathematical description
- •4.4.3 Phase conjugation by degenerate four-wave mixing
- •4.4.4 Self-pumped phase conjugation
- •4.4.5 Applications of SBS phase conjugation
- •4.4.6 Photorefraction
- •References for 4.4
References for 2.1 |
51 |
|
|
References for 2.1
58Sch |
Schley, U., Ho mann, F.: Optik (Stuttgart) 15 (1958) 358. |
65Ble |
Blevin, W.R., Brown, W.J: J. Sci. Instrum. 42 (1965) 19. |
68Smi |
Smith, R.A., Jones, F.E., Chasmar, R.P.: The detection and measurement of infrared |
|
radiation, London and New York: Oxford University Press, 1968. |
70Edw |
Edwards, J.G.: J. Phys. E: Sci. Instrum. 3 (1970) 452. |
70Put |
Putley, E.H.: Semiconductors and semimetals, Vol. 5, New York: Academic Press, 1970, |
|
p. 259. |
70Ste |
Stevens, N.B.: Semiconductors and semimetals, Vol. 5, New York: Academic Press, 1970, |
|
p. 287. |
74Gun |
Gunn, S.R.: Rev. Sci. Instrum. 45 (1974) 936. |
75Tif |
Ti any, W.B.: Proc. SPIE (Int. Soc. Opt. Eng.) 62 (1975) 153. |
77Gun |
Gunn, S.R., Rupert, V.: Rev. Sci. Instrum. 48 (1977) 1375. |
79Wil |
Willson, R.C.: Appl. Opt. 18 (1979) 179. |
81Sze |
Sze, S.M.: Physics of semiconductor devices, New York: Wiley, 1981, p. 743. |
82Mat |
Mather, J.C.: Appl. Opt. 21 (1982) 1125. |
85Qui |
Quinn, T.J., Martin, J.E.: Philos. Trans. R. Soc. (London) A 316 (1985) 85. |
86Kim |
Kimura, W.D., Ford, D.H.: Rev. Sci. Instrum. 57 (1986) 2754. |
87McD |
McDonald, D.G.: Appl. Phys. Lett. 50 (1987) 775. |
88Ino |
Inoue, T., Endo, M., Yokoshima, I., Kawahara, K.: Rev. Sci. Instrum. 59 (1988) 2384. |
89Fro |
Fr¨ohlich, C.: Inst. Phys. Conf. Ser. 92 (1989) 73. |
89Hen |
Hengstberger, F.: Absolute radiometry, San Diego: Academic Press, 1989. |
89Moe |
M¨ostl, K.: Inst. Phys. Conf. Ser. 92 (1989) 11. |
90Yua |
Yuan, Y.: Rev. Sci. Instrum. 61 (1990) 1743. |
91Moe |
M¨ostl, K., Brandt, F.: Metrologia 28 (1991) 121. |
91Rad |
Radak, Bo.B., Radak, Br.B.: Rev. Sci. Instrum. 62 (1991) 318. |
93Fu |
Fu Lei, Fischer, J.: Metrologia 30 (1993) 297–303. |
96Bra |
Brandt, F., M¨ostl, K.: Laser in Forschung und Technik, Berlin: Springer-Verlag, 1996, |
|
p. 730. |
96Fox |
Fox, N.P.: Metrologia 32 (1995/96) 535–543. |
96Sap |
Sapritsky, V.I.: Metrologia 32 (1995/96) 411–417. |
96Wen |
Wende, B.: Metrologia 32 (1995/96) 419–424. |
Landolt-B¨ornstein
New Series VIII/1A1