- •Preface
- •Contents
- •1.1 Fundamentals of the semiclassical laser theory
- •1.1.1 The laser oscillator
- •1.1.2.2 Homogeneous, isotropic, linear dielectrics
- •1.1.2.2.1 The plane wave
- •1.1.2.2.2 The spherical wave
- •1.1.2.2.3 The slowly varying envelope (SVE) approximation
- •1.1.2.3 Propagation in doped media
- •1.1.3 Interaction with two-level systems
- •1.1.3.1 The two-level system
- •1.1.3.2 The dipole approximation
- •1.1.3.2.1 Inversion density and polarization
- •1.1.3.3.1 Decay time T1 of the upper level (energy relaxation)
- •1.1.3.3.1.1 Spontaneous emission
- •1.1.3.3.1.2 Interaction with the host material
- •1.1.3.3.1.3 Pumping process
- •1.1.3.3.2 Decay time T2 of the polarization (entropy relaxation)
- •1.1.4 Steady-state solutions
- •1.1.4.1 Inversion density and polarization
- •1.1.4.2 Small-signal solutions
- •1.1.4.3 Strong-signal solutions
- •1.1.5 Adiabatic equations
- •1.1.5.1 Rate equations
- •1.1.5.2 Thermodynamic considerations
- •1.1.5.3 Pumping schemes and complete rate equations
- •1.1.5.3.1 The three-level system
- •1.1.5.3.2 The four-level system
- •1.1.5.5 Rate equations for steady-state laser oscillators
- •1.1.6 Line shape and line broadening
- •1.1.6.1 Normalized shape functions
- •1.1.6.1.1 Lorentzian line shape
- •1.1.6.1.2 Gaussian line shape
- •1.1.6.1.3 Normalization of line shapes
- •1.1.6.2 Mechanisms of line broadening
- •1.1.6.2.1 Spontaneous emission
- •1.1.6.2.2 Doppler broadening
- •1.1.6.2.3 Collision or pressure broadening
- •1.1.6.2.4 Saturation broadening
- •1.1.6.3 Types of broadening
- •1.1.6.3.1 Homogeneous broadening
- •1.1.6.3.2 Inhomogeneous broadening
- •1.1.6.4 Time constants
- •1.1.7 Coherent interaction
- •1.1.7.1 The Feynman representation of interaction
- •1.1.7.3 Propagation of resonant coherent pulses
- •1.1.7.3.2 Superradiance
- •1.1.8 Notations
- •References for 1.1
- •2.1.1 Introduction
- •2.1.3 Radiometric standards
- •2.1.3.1 Primary standards
- •2.1.3.2 Secondary standards
- •References for 2.1
- •2.2 Beam characterization
- •2.2.1 Introduction
- •2.2.2 The Wigner distribution
- •2.2.3 The second-order moments of the Wigner distribution
- •2.2.4 The second-order moments and related physical properties
- •2.2.4.3 Phase paraboloid and twist
- •2.2.4.4 Invariants
- •2.2.4.5 Propagation of beam widths and beam propagation ratios
- •2.2.5.1 Stigmatic beams
- •2.2.5.2 Simple astigmatic beams
- •2.2.5.3 General astigmatic beams
- •2.2.5.4 Pseudo-symmetric beams
- •2.2.5.5 Intrinsic astigmatism and beam conversion
- •2.2.6 Measurement procedures
- •2.2.7 Beam positional stability
- •References for 2.2
- •3 Linear optics
- •3.1 Linear optics
- •3.1.1 Wave equations
- •3.1.2 Polarization
- •3.1.3 Solutions of the wave equation in free space
- •3.1.3.1 Wave equation
- •3.1.3.1.1 Monochromatic plane wave
- •3.1.3.1.2 Cylindrical vector wave
- •3.1.3.1.3 Spherical vector wave
- •3.1.3.2 Helmholtz equation
- •3.1.3.2.1 Plane wave
- •3.1.3.2.2 Cylindrical wave
- •3.1.3.2.3 Spherical wave
- •3.1.3.2.4.2 Real Bessel beams
- •3.1.3.2.4.3 Vectorial Bessel beams
- •3.1.3.3 Solutions of the slowly varying envelope equation
- •3.1.3.3.1 Gauss-Hermite beams (rectangular symmetry)
- •3.1.3.3.2 Gauss-Laguerre beams (circular symmetry)
- •3.1.3.3.3 Cross-sectional shapes of the Gaussian modes
- •3.1.4.4.2 Circular aperture with radius a
- •3.1.4.4.2.1 Applications
- •3.1.4.4.3 Gratings
- •3.1.5 Optical materials
- •3.1.5.1 Dielectric media
- •3.1.5.2 Optical glasses
- •3.1.5.3 Dispersion characteristics for short-pulse propagation
- •3.1.5.4 Optics of metals and semiconductors
- •3.1.5.6 Special cases of refraction
- •3.1.5.6.2 Variation of the angle of incidence
- •3.1.5.7 Crystal optics
- •3.1.5.7.2 Birefringence (example: uniaxial crystals)
- •3.1.5.8 Photonic crystals
- •3.1.5.9 Negative-refractive-index materials
- •3.1.5.10 References to data of linear optics
- •3.1.6 Geometrical optics
- •3.1.6.1 Gaussian imaging (paraxial range)
- •3.1.6.1.1 Single spherical interface
- •3.1.6.1.2 Imaging with a thick lens
- •3.1.6.2.1 Simple interfaces and optical elements with rotational symmetry
- •3.1.6.2.2 Non-symmetrical optical systems
- •3.1.6.2.3 Properties of a system
- •3.1.6.2.4 General parabolic systems without rotational symmetry
- •3.1.6.2.5 General astigmatic system
- •3.1.6.2.6 Symplectic optical system
- •3.1.6.2.7 Misalignments
- •3.1.6.3 Lens aberrations
- •3.1.7 Beam propagation in optical systems
- •3.1.7.2.1 Stigmatic and simple astigmatic beams
- •3.1.7.2.1.1 Fundamental Mode
- •3.1.7.2.1.2 Higher-order Hermite-Gaussian beams in simple astigmatic beams
- •3.1.7.2.2 General astigmatic beam
- •3.1.7.3 Waist transformation
- •3.1.7.3.1 General system (fundamental mode)
- •3.1.7.3.2 Thin lens (fundamental mode)
- •3.1.7.4 Collins integral
- •3.1.7.4.1 Two-dimensional propagation
- •3.1.7.4.2 Three-dimensional propagation
- •3.1.7.5 Gaussian beams in optical systems with stops, aberrations, and waveguide coupling
- •3.1.7.5.1 Field distributions in the waist region of Gaussian beams including stops and wave aberrations by optical system
- •3.1.7.5.2 Mode matching for beam coupling into waveguides
- •3.1.7.5.3 Free-space coupling of Gaussian modes
- •References for 3.1
- •4.1 Frequency conversion in crystals
- •4.1.1 Introduction
- •4.1.1.1 Symbols and abbreviations
- •4.1.1.1.1 Symbols
- •4.1.1.1.2 Abbreviations
- •4.1.1.1.3 Crystals
- •4.1.1.2 Historical layout
- •4.1.2 Fundamentals
- •4.1.2.1 Three-wave interactions
- •4.1.2.2 Uniaxial crystals
- •4.1.2.3 Biaxial crystals
- •4.1.2.5.1 General approach
- •4.1.3 Selection of data
- •4.1.5 Sum frequency generation
- •4.1.7 Optical parametric oscillation
- •4.1.8 Picosecond continuum generation
- •References for 4.1
- •4.2 Frequency conversion in gases and liquids
- •4.2.1 Fundamentals of nonlinear optics in gases and liquids
- •4.2.1.1 Linear and nonlinear susceptibilities
- •4.2.1.2 Third-order nonlinear susceptibilities
- •4.2.1.3 Fundamental equations of nonlinear optics
- •4.2.1.4 Small-signal limit
- •4.2.1.5 Phase-matching condition
- •4.2.2 Frequency conversion in gases
- •4.2.2.1 Metal-vapor inert gas mixtures
- •4.2.2.3 Mixtures of gaseous media
- •References for 4.2
- •4.3 Stimulated scattering
- •4.3.1 Introduction
- •4.3.1.1 Spontaneous scattering processes
- •4.3.1.2 Relationship between stimulated Stokes scattering and spontaneous scattering
- •4.3.2 General properties of stimulated scattering
- •4.3.2.1 Exponential gain by stimulated Stokes scattering
- •4.3.2.2 Experimental observation
- •4.3.2.2.1 Generator setup
- •4.3.2.2.2 Oscillator setup
- •4.3.2.3 Four-wave interactions
- •4.3.2.3.1 Third-order nonlinear susceptibility
- •4.3.2.3.3 Higher-order Stokes and anti-Stokes emission
- •4.3.2.4 Transient stimulated scattering
- •4.3.3 Individual scattering processes
- •4.3.3.1 Stimulated Raman scattering (SRS)
- •4.3.3.2 Stimulated Brillouin scattering (SBS) and stimulated thermal Brillouin scattering (STBS)
- •4.3.3.3 Stimulated Rayleigh scattering processes, SRLS, STRS, and SRWS
- •References for 4.3
- •4.4 Phase conjugation
- •4.4.1 Introduction
- •4.4.2 Basic mathematical description
- •4.4.3 Phase conjugation by degenerate four-wave mixing
- •4.4.4 Self-pumped phase conjugation
- •4.4.5 Applications of SBS phase conjugation
- •4.4.6 Photorefraction
- •References for 4.4
Ref. p. 187] |
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4.1 Frequency conversion in crystals |
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Table 4.1.4. Units and conversion factors. |
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Nonlinear coe cient |
MKS or SI units |
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CGS or electrostatic units |
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χ(1) |
1 |
(SI, dimensionless) |
= |
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1 |
(esu, dimensionless) |
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4 π |
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dij or χ(2) |
1 |
V−1m |
= |
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3 × 104 |
(erg−1 cm3) 21 |
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ijk |
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4 π |
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4 π |
1 |
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δij |
1 |
C−1m2 |
= |
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(erg−1 cm3) 2 |
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3 × 105 |
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Note that in SI units P (n) |
= |
ε0 χ(n)E n (with P (n) |
expressed in C m−2 ), whereas in CGS or esu |
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units P (n) = χ(n)E n (with P (n) |
expressed in esu). |
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4.1.2.5 Frequency conversion e ciency
4.1.2.5.1 General approach
The conversion e ciency of a three-wave interaction process for the case of square nonlinearity
P nl = ε0 χ(2)E2 |
(4.1.14) |
can be determined from the wave equation derived from Maxwell’s equations [64Akh, 65Blo, 73Zer, 99Dmi], see also (1.1.4)–(1.1.7),
× × E + |
(1 + χ(1)) ∂2E |
= − |
1 |
∂2P nl |
(4.1.15) |
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c2 |
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∂t2 |
ε0 c2 |
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∂t2 |
with the initial and boundary conditions for the electric field E .
An exact calculation of the nonlinear conversion e ciency for SHG, SFG, and DFG generally requires a numerical calculation. In some simple cases analytical expressions are available. In order to choose the proper method, the contribution of di erent e ects in the nonlinear mixing process should be determined. For this purpose the following approach is introduced [99Dmi]:
–Consider the e ective lengths of the interaction process:
1.Aperture length La:
La = d0 ρ−1 , |
(4.1.16) |
where d0 is the beam diameter. |
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2. Quasistatic interaction length Lqs: |
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Lqs = τ ν−1 , |
(4.1.17) |
where τ is the radiation pulse width and ν is the mismatch of reverse group velocities. For SHG
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ν = uω−1 − u2−ω1 , |
(4.1.18) |
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where uω and u2ω are the group velocities of the corresponding waves ω and 2ω . |
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3. |
Di raction length Ldif : |
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L |
= k d2 . |
(4.1.19) |
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dif |
0 |
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4. |
Dispersion-spreading length Lds: |
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Lds = τ 2g−1 , |
(4.1.20) |
Landolt-B¨ornstein
New Series VIII/1A1
152 |
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4.1.2 Fundamentals |
[Ref. p. 187 |
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where g is the dispersion-spreading coe cient |
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∂ 2k |
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g = |
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(4.1.21) |
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∂ ω2 |
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5. Nonlinear interaction length Lnl: |
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Lnl = (σ a0)−1 . |
(4.1.22) |
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Here σ is the nonlinear coupling coe cient: |
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σ1,2 = 4 π k1,2 n1−,22 de , |
(4.1.23) |
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σ3 = 2 π k3 n3−2 de , |
(4.1.24) |
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and |
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a0 = a12 |
1 |
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(0) + a22 (0) + a32 (0) 2 , |
(4.1.25) |
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where an(0) are the wave amplitudes of interacting waves λ1 , λ2 , and λ3 |
at the input |
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surface of the crystal. |
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–The length of the crystal L should be compared with Le from above equations. If L < Le the respective e ect can be neglected.
4.1.2.5.2 Plane-wave fixed-field approximation
When the conditions L < Lnl and L < Le are fulfilled, the so-called fixed-field approximation is realized. For SHG, ω + ω = 2ω and ∆k = 2kω − k2ω , the conversion e ciency η is determined by the equation:
η = P2ω /Pω = |
2 π2de2 L2Pω |
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sinc2 |
|∆k| L |
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ε0 c nω2 n2 ω λ22 A |
2 |
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For SFG, ω1 + ω2 = ω3 and ∆k = k1 + k2 − k3 , the conversion e ciency η is:
η = P3/P1 = |
8 π2de2 L2P2 |
sinc2 |
|∆k| L |
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ε0 c n1 n2 n3 λ32 A |
2 |
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For DFG, ω1 = ω3 − ω2 and ∆k = k1 + k2 − k3 , the conversion e ciency η is:
η = P1/P3 = |
8 π2de2 L2P2 |
sinc2 |
|∆k| L |
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ε0 c n1 n2 n3 λ12 A |
2 |
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(4.1.26)
(4.1.27)
(4.1.28)
Note that all the above equations are for the SI system, i.e. [de ] = m/V ; [P ] = W ; [L] = m ; [λ] = m ; [A] = m2 ; ε0 = 8.854 × 10−12 A s/ (V m) ; c = 3 × 108 m/s .
When the powers of the mixing waves are almost equal, the conversion e ciency is for THG,
ω + 2 ω = 3ω : |
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P3ω |
1 ; |
(4.1.29) |
η = |
(P2 ω Pω ) 2
Landolt-B¨ornstein
New Series VIII/1A1
Ref. p. 187] |
4.1 Frequency conversion in crystals |
153 |
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for FOHG in the case of ω + 3ω = 4ω :
P4ω
η = 1 ,
(P3ω Pω ) 2
or for 2 ω + 2 ω = 4ω :
η= P4ω ;
P2 ω
for SFG, ω1 + ω2 = ω3 :
P3
η = 1 ; (P1P2) 2
for DFG, ω1 = ω3 − ω2 :
P1
η = 1 .
(P2P3) 2
(4.1.30)
(4.1.31)
(4.1.32)
(4.1.33)
In some cases (mentioned additionally) the conversion e ciency is calculated from the power (energy) of fundamental radiation, e.g. for fifth harmonic generation, ω + 4ω = 5ω :
η = |
P5ω |
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(4.1.34) |
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Pω |
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Corresponding equations are valid for energy conversion e ciencies by substituting the pulse energy instead of power in the above equations.
The e ciency η in the case of OPO is calculated by the equation
η = |
EOPO |
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(4.1.35) |
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E0 |
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where EOPO is the total OPO radiation energy (signal + idler) and E0 is the energy of the pump radiation. Conversion e ciency can also be determined in terms of pump depletion:
Eunc |
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(4.1.36) |
η = 1 − Epump |
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where Eunc is the energy of unconverted pumping beam after the OPO crystals. Pump depletions are usually significantly greater than the ordinary η values.
The quantum conversion e ciency (for the ratio of converted and mixing quanta) in the case of exact phase-matching (∆ k = 0) for sum-frequency generation, ω1 + ω2 = ω3 , is determined by the following equation (SI system):
η = P1 |
λ1 |
= sin2 |
2 π de L |
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(4.1.37) |
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ε0 c n1 n2 n3 λ1 λ3 A |
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P3 |
λ3 |
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2P2 |
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and for di erence-frequency generation, ω1 = ω3 − ω2 : |
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η = P3 |
λ3 |
= sin2 |
2 π de L |
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(4.1.38) |
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ε0 c n1 n2 n3 λ1 λ3 A |
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P1 |
λ1 |
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2P2 |
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In the presence of linear absorption all the above equations for conversion e ciencies should be multiplied by the factor
exp (−αL) ≈ 1 − αL , |
(4.1.39) |
where α is the linear absorption coe cient of the crystal.
Landolt-B¨ornstein
New Series VIII/1A1