- •Contents
- •Preface
- •1.1 Elementary thermodynamic ideas of surfaces
- •1.1.1 Thermodynamic potentials and the dividing surface
- •1.1.2 Surface tension and surface energy
- •1.1.3 Surface energy and surface stress
- •1.2 Surface energies and the Wulff theorem
- •1.2.1 General considerations
- •1.2.3 Wulff construction and the forms of small crystals
- •1.3 Thermodynamics versus kinetics
- •1.3.1 Thermodynamics of the vapor pressure
- •1.3.2 The kinetics of crystal growth
- •1.4 Introduction to surface and adsorbate reconstructions
- •1.4.1 Overview
- •1.4.2 General comments and notation
- •1.4.7 Polar semiconductors, such as GaAs(111)
- •1.5 Introduction to surface electronics
- •1.5.3 Surface states and related ideas
- •1.5.4 Surface Brillouin zone
- •1.5.5 Band bending, due to surface states
- •1.5.6 The image force
- •1.5.7 Screening
- •Further reading for chapter 1
- •Problems for chapter 1
- •2.1 Kinetic theory concepts
- •2.1.1 Arrival rate of atoms at a surface
- •2.1.2 The molecular density, n
- •2.2 Vacuum concepts
- •2.2.1 System volumes, leak rates and pumping speeds
- •2.2.2 The idea of conductance
- •2.2.3 Measurement of system pressure
- •2.3 UHV hardware: pumps, tubes, materials and pressure measurement
- •2.3.1 Introduction: sources of information
- •2.3.2 Types of pump
- •2.3.4 Choice of materials
- •2.3.5 Pressure measurement and gas composition
- •2.4.1 Cleaning and sample preparation
- •2.4.3 Sample transfer devices
- •2.4.4 From laboratory experiments to production processes
- •2.5.1 Historical descriptions and recent compilations
- •2.5.2 Thermal evaporation and the uniformity of deposits
- •2.5.3 Molecular beam epitaxy and related methods
- •2.5.4 Sputtering and ion beam assisted deposition
- •2.5.5 Chemical vapor deposition techniques
- •Further reading for chapter 2
- •Problems for chapter 2
- •3.1.1 Surface techniques as scattering experiments
- •3.1.2 Reasons for surface sensitivity
- •3.1.3 Microscopic examination of surfaces
- •3.1.4 Acronyms
- •3.2.1 LEED
- •3.2.2 RHEED and THEED
- •3.3 Inelastic scattering techniques: chemical and electronic state information
- •3.3.1 Electron spectroscopic techniques
- •3.3.2 Photoelectron spectroscopies: XPS and UPS
- •3.3.3 Auger electron spectroscopy: energies and atomic physics
- •3.3.4 AES, XPS and UPS in solids and at surfaces
- •3.4.2 Ratio techniques
- •3.5.1 Scanning electron and Auger microscopy
- •3.5.3 Towards the highest spatial resolution: (a) SEM/STEM
- •Further reading for chapter 3
- •Problems, talks and projects for chapter 3
- •4.2 Statistical physics of adsorption at low coverage
- •4.2.1 General points
- •4.2.2 Localized adsorption: the Langmuir adsorption isotherm
- •4.2.4 Interactions and vibrations in higher density adsorbates
- •4.3 Phase diagrams and phase transitions
- •4.3.1 Adsorption in equilibrium with the gas phase
- •4.3.2 Adsorption out of equilibrium with the gas phase
- •4.4 Physisorption: interatomic forces and lattice dynamical models
- •4.4.1 Thermodynamic information from single surface techniques
- •4.4.2 The crystallography of monolayer solids
- •4.4.3 Melting in two dimensions
- •4.4.4 Construction and understanding of phase diagrams
- •4.5 Chemisorption: quantum mechanical models and chemical practice
- •4.5.1 Phases and phase transitions of the lattice gas
- •4.5.4 Chemisorption and catalysis: macroeconomics, macromolecules and microscopy
- •Further reading for chapter 4
- •Problems and projects for chapter 4
- •5.1 Introduction: growth modes and nucleation barriers
- •5.1.1 Why are we studying epitaxial growth?
- •5.1.3 Growth modes and adsorption isotherms
- •5.1.4 Nucleation barriers in classical and atomistic models
- •5.2 Atomistic models and rate equations
- •5.2.1 Rate equations, controlling energies, and simulations
- •5.2.2 Elements of rate equation models
- •5.2.3 Regimes of condensation
- •5.2.4 General equations for the maximum cluster density
- •5.2.5 Comments on individual treatments
- •5.3 Metal nucleation and growth on insulating substrates
- •5.3.1 Microscopy of island growth: metals on alkali halides
- •5.3.2 Metals on insulators: checks and complications
- •5.4 Metal deposition studied by UHV microscopies
- •5.4.2 FIM studies of surface diffusion on metals
- •5.4.3 Energies from STM and other techniques
- •5.5 Steps, ripening and interdiffusion
- •5.5.2 Steps as sources: diffusion and Ostwald ripening
- •5.5.3 Interdiffusion in magnetic multilayers
- •Further reading for chapter 5
- •Problems and projects for chapter 5
- •6.1 The electron gas: work function, surface structure and energy
- •6.1.1 Free electron models and density functionals
- •6.1.2 Beyond free electrons: work function, surface structure and energy
- •6.1.3 Values of the work function
- •6.1.4 Values of the surface energy
- •6.2 Electron emission processes
- •6.2.1 Thermionic emission
- •6.2.4 Secondary electron emission
- •6.3.1 Symmetry, symmetry breaking and phase transitions
- •6.3.3 Magnetic surface techniques
- •6.3.4 Theories and applications of surface magnetism
- •Further reading for chapter 6
- •Problems and projects for chapter 6
- •7.1.1 Bonding in diamond, graphite, Si, Ge, GaAs, etc.
- •7.1.2 Simple concepts versus detailed computations
- •7.2 Case studies of reconstructed semiconductor surfaces
- •7.2.2 GaAs(111), a polar surface
- •7.2.3 Si and Ge(111): why are they so different?
- •7.2.4 Si, Ge and GaAs(001), steps and growth
- •7.3.1 Thermodynamic and elasticity studies of surfaces
- •7.3.2 Growth on Si(001)
- •7.3.3 Strained layer epitaxy: Ge/Si(001) and Si/Ge(001)
- •7.3.4 Growth of compound semiconductors
- •Further reading for chapter 7
- •Problems and projects for chapter 7
- •8.1 Metals and oxides in contact with semiconductors
- •8.1.1 Band bending and rectifying contacts at semiconductor surfaces
- •8.1.2 Simple models of the depletion region
- •8.1.3 Techniques for analyzing semiconductor interfaces
- •8.2 Semiconductor heterojunctions and devices
- •8.2.1 Origins of Schottky barrier heights
- •8.2.2 Semiconductor heterostructures and band offsets
- •8.3.1 Conductivity, resistivity and the relaxation time
- •8.3.2 Scattering at surfaces and interfaces in nanostructures
- •8.3.3 Spin dependent scattering and magnetic multilayer devices
- •8.4 Chemical routes to manufacturing
- •8.4.4 Combinatorial materials development and analysis
- •Further reading for chapter 8
- •9.1 Electromigration and other degradation effects in nanostructures
- •9.2 What do the various disciplines bring to the table?
- •9.3 What has been left out: future sources of information
- •References
- •Index
154 5 Surface processes in epitaxial growth
Table 5.1. Parameter dependencies of the maximum cluster density
Regime |
3D islands |
2D islands |
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Extreme incomplete |
p52i/3 |
i |
|
E5(2/3)[Ei1(i11)Ea 2 Ed] |
[Ei1(i11)Ea 2 Ed] |
Initially incomplete |
p52i/5 |
i/2 |
|
E5(2/5)[Ei1iEa] |
[Ei1iEa] |
Complete |
p5i/(i12.5) |
i/(i12) |
|
E5(Ei1iEd)/(i12.5) |
(Ei1iEd)/(i12) |
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about how surfactants might work, especially in relation to semiconductor growth; at this stage a surfactant can be thought of as any foreign species which remains at the surface as growth proceeds.
5.2.4General equations for the maximum cluster density
The ®nal question following this type of reasoning is to ask whether there is a general equation for the maximum cluster density, which yields these three regimes as limiting cases. The answer is yes, but the resulting equation is not especially simple. We can see that (5.11) will lead to a maximum in the stable cluster density at the point where the (positive) nucleation term is balanced by the (negative) coalescence term. At this point,
dnx/dt50 and the coverage of the substrate by islands Z5Z0. If we make substitutions for all the various terms, then we will obtain an explicit expression for nx(Z0). As a practical point, we can calculate the Z-dependence of nx, within each of the condensation regimes, and obtain pre-exponentials h(Z,i) for each of these regimes, as illustrated for
3D and 2D islands in complete condensation in ®gure 5.6. The following arguments are aided by the fact that these pre-exponentials, which multiply the parameter dependencies of table 5.1, are only weakly dependent on both Z and the critical size i.
Although the coverage Z0 depends on the formula chosen for the coalescence term Ucl, which in turn depends on the spatial correlations that develop during growth, none of this in¯uences the exponential terms in the equations. Here we use the coalescence
expression due to Vincent (1971), where Ucl52nxdZ/dt. The rest is algebra, starting from (5.11). Inserting the Walton equation (5.9) for ni, the steady state equation (5.13) for n1 (neglecting the nucleation term Rtn), and specializing to 2D islands, nx is then given, after considerable rearrangement, by
n |
x |
(g1r)i (Z |
1r)5f (R/D)i {exp (E |
/kT)}(s |
Dt )i 11. |
(5.14) |
|
0 |
i |
x |
a |
|
The slowly varying numerical functions f and g involve the capture numbers si and sx. For 3D islands, nx is changed to nx3/2 on the left hand side of (5.14), and the constants change a little (Venables 1987).
A point that may have been misunderstood is the following: the arguments of this section have been carried through on the assumption that the critical nucleus size is i. The actual critical nucleus size is that which produces the lowest nucleation rate and density; it is only then that the critical nucleus is consistent with the highest free energy
5.2 Atomistic models and rate equations |
155 |
|
|
Figure 5.6. Pre-exponential factors h(Z,i) in the complete condensation regime: (a) 3D islands for i51, 2 and 3 with sx evaluated in the lattice (full line) and uniform depletion (dashed line) approximations; (b) 2D islands for i51±20, with sx approximated by 4p/(2 lnZ) which is very close to the uniform depletion approximation (Venables et al. 1984, reproduced with permission).
DG( j), for j5i, as discussed in section 5.1.3. The critical nucleus size is thus determined self consistently as an output, not an input, of an iterative calculation for all feasible assumed critical sizes. In complete condensation the ratio r; ta/tc is much greater than both g and Z0, corresponding to adatom capture being much more probable than reevaporation. In the extreme incomplete regime both r and g,,Z0. In between we have Z0,r,g, where most cluster growth occurs by diVusive capture, at least initially. It is a straightforward exercise to check that these conditions on (5.14) lead to the parameter dependencies given in table 5.1; keeping track of all the pre-exponential terms requires patience, and cross checks with the original literature.
5.2.5Comments on individual treatments
The argument of the last section indicates that nucleation equations are only soluble if
we know the Ei to enter into (5.11) or (5.14); however, we have also noted that the value of i is itself determined implicitly. This means that the predictions are only explicit if
156 5 Surface processes in epitaxial growth
(a) |
1000 |
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θ)(s |
100 |
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10 |
(iii) |
(ii) |
(i) |
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1 |
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10 −5 |
10 −3 |
10 −1 |
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θ |
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θ =0.05 |
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1.0 |
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θ =0.1 |
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θ=0.15 |
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50 |
100 |
150 |
200 |
250 |
300 |
350 |
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s |
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Figure 5.7. Comparison of rate equation (solid lines) and KMC calculations (dashed lines) of
(a) the average number of atoms (sÅ) in a monolayer island, for the ratio (D/R)5(i) 105, (ii) 107 and (iii) 109; (b) the size distribution of islands Kns(u)L as a function of coverage u, for u50.05, 0.1 and 0.15 (after Bales & Chrzan 1994, reproduced with permission).
we can calculate, within the model, the binding energy Ej for all sizes j. This is the principal reason why a pair binding model is invoked: life is too complicated otherwise. For 2D clusters, this simpli®cation allows us to estimate Ej5bjEb, where bj is the number of lateral bonds in the cluster, each of strength Eb. However, by retaining Ea as the verti- cal bonding to the substrate, we have enough freedom to model large diVerences between vertical and lateral bonding, within a three-parameter ®t to nucleation and growth data. This feature of the pair binding model is important in giving us enough latitude to mirror, in the simplest way, the diVerent types of bonding which actually occur in the growth of one material on another.
In developing the above model (Venables 1987), vibrations were included in a selfconsisent way within the mean ®eld framework outlined above. It is very easy to construct a model which is inconsistent with the equilibrium vapor pressure of the deposit unless the vibrations are treated reasonably carefully. This paper builds on the Einstein model calculations which we have done as problems in chapter 1, and is the basis for subsequent model calculations described here.
In the past few years there have been many related treatments by several groups, mostly in response to the new UHV STM-based experimental results, which have studied nucleation and growth down to the sub-monolayer level. Recent papers include a detailed comparison of rate equations and KMC simulations for i51 in the complete condensation limit (Bales & Chrzan 1994). The KMC work is important for checking that the rate equation treatment works well for average quantities, such as the nucleation density, nx, or the average number of atoms in an island, wx, as shown in ®gure 5.7(a); but it also shows that the treatment does not do a good job on quantities such as size distributions, shown in ®gure 5.7(b), which are dependent on the local environment,