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Figure 15.8: Plot of Surface Deposition Rate of Ga

Extra

You can also perform all the postprocessing steps to analyze the deposition of As.

7. Save the case and data files (surface-react2.cas.gz and surface-react2.dat.gz).

File → Write → Case & Data...

15.5. Summary

The main focus of this tutorial is the accurate modeling of macroscopic gas flow, heat and mass transfer, species diffusion, and chemical reactions (including surface reactions) in a rotating disk CVD reactor. In this tutorial, you learned how to use the two-step surface reactions involving site species, and computed simultaneous deposition of gallium and arsenide from a mixture of precursor gases on a rotating susceptor. Note that the same approach is valid if you are simulating multi-step reactions with multiple sites/site species.

15.6. Further Improvements

This tutorial guides you through the steps to reach an initial solution. You may be able to obtain a more accurate solution by using an appropriate higher-order discretization scheme and by adapting the mesh. Mesh adaption can also ensure that the solution is independent of the mesh. These steps are demonstrated in Fluid Flow and Heat Transfer in a Mixing Elbow (p. 35).

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